THE EFFECTIVE CHEMICAL-VAPOR-DEPOSITION RATE OF DIAMOND

被引:11
作者
PARTRIDGE, PG [1 ]
ASHFOLD, MNR [1 ]
MAY, PW [1 ]
NICHOLSON, ED [1 ]
机构
[1] UNIV BRISTOL,SCH CHEM,BRISTOL BS8 1TS,AVON,ENGLAND
关键词
D O I
10.1007/BF00360696
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The effective chemical vapour deposition (CVD) rate of diamond, defined as the total thickness of diamond or as the mass of diamond deposited per unit time, may be increased by orders of magnitude by increasing the substrate area per unit volume. To obtain these high deposition rates, novel substrate designs are proposed that exploit three-dimensional arrays of small diameter wires or fibres. The analysis suggests that the increased diamond output should be achieved with no increase in the net gas flow or power consumption, which could lead to the more economic production of solid diamond shapes and of composites containing continuous or short diamond fibres, or particulate diamond. Estimates for the cost of CVD diamond made by the fibre array technique are compared with reported current and predicted costs for CVD diamond and estimates for the cost of CVD SiC.
引用
收藏
页码:3973 / 3982
页数:10
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