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REFRACTIVE-INDEX DISPERSION OF DIELECTRIC FILMS USED IN THE SEMICONDUCTOR INDUSTRY
被引:18
作者
:
PLISKIN, WA
论文数:
0
引用数:
0
h-index:
0
机构:
IBM, Hopewell Junction, NY, USA, IBM, Hopewell Junction, NY, USA
PLISKIN, WA
机构
:
[1]
IBM, Hopewell Junction, NY, USA, IBM, Hopewell Junction, NY, USA
来源
:
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
|
1987年
/ 134卷
/ 11期
关键词
:
D O I
:
10.1149/1.2100295
中图分类号
:
O646 [电化学、电解、磁化学];
学科分类号
:
081704 ;
摘要
:
引用
收藏
页码:2819 / 2826
页数:8
相关论文
共 12 条
[1]
THICKNESS MEASUREMENT OF SILICON DIOXIDE LAYERS BY ULTRAVIOLET-VISIBLE INTERFERENCE METHOD
CORL, EA
论文数:
0
引用数:
0
h-index:
0
CORL, EA
WIMPFHEIMER, H
论文数:
0
引用数:
0
h-index:
0
WIMPFHEIMER, H
[J].
SOLID-STATE ELECTRONICS,
1964,
7
(10)
: 755
-
&
[2]
IOTA, A NEW COMPUTER CONTROLLED THIN-FILM THICKNESS MEASUREMENT TOOL
KONNERTH, KL
论文数:
0
引用数:
0
h-index:
0
KONNERTH, KL
[J].
SOLID-STATE ELECTRONICS,
1972,
15
(04)
: 371
-
&
[3]
INTERSPECIMEN COMPARISON OF REFRACTIVE INDEX OF FUSED SILICA
MALITSON, IH
论文数:
0
引用数:
0
h-index:
0
MALITSON, IH
[J].
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA,
1965,
55
(10P1)
: 1205
-
&
[4]
Pliskin W. A., 1977, IBM Technical Disclosure Bulletin, V20, P1775
[5]
NONDESTRUCTIVE DETERMINATION OF THICKNESS + REFRACTIVE INDEX OF TRANSPARENT FILMS
PLISKIN, WA
论文数:
0
引用数:
0
h-index:
0
PLISKIN, WA
CONRAD, EE
论文数:
0
引用数:
0
h-index:
0
CONRAD, EE
[J].
IBM JOURNAL OF RESEARCH AND DEVELOPMENT,
1964,
8
(01)
: 43
-
&
[6]
PLISKIN WA, 1969, PHYSICAL MEASUREMENT, P1
[7]
PLISKIN WA, 1974, ELECTROCHEMICAL SOC, P91
[8]
PLISKIN WA, 1970, HDB THIN FILM TECHNO, pCH11
[9]
OPTICAL THICKNESS MEASUREMENT OF SIO2-SI3N4 FILMS ON SILICON
REIZMAN, F
论文数:
0
引用数:
0
h-index:
0
REIZMAN, F
VANGELDE.W
论文数:
0
引用数:
0
h-index:
0
VANGELDE.W
[J].
SOLID-STATE ELECTRONICS,
1967,
10
(07)
: 625
-
&
[10]
REFRACTIVE-INDEX DISPERSION IN SEMICONDUCTOR-RELATED THIN-FILMS
WARNECKE, AJ
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,SYST PROD DIV LAB,E FISHKILL FACIL,HOPEWELL JUNCTION,NY 12533
IBM CORP,SYST PROD DIV LAB,E FISHKILL FACIL,HOPEWELL JUNCTION,NY 12533
WARNECKE, AJ
LOPRESTI, PJ
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,SYST PROD DIV LAB,E FISHKILL FACIL,HOPEWELL JUNCTION,NY 12533
IBM CORP,SYST PROD DIV LAB,E FISHKILL FACIL,HOPEWELL JUNCTION,NY 12533
LOPRESTI, PJ
[J].
IBM JOURNAL OF RESEARCH AND DEVELOPMENT,
1973,
17
(03)
: 256
-
262
←
1
2
→
共 12 条
[1]
THICKNESS MEASUREMENT OF SILICON DIOXIDE LAYERS BY ULTRAVIOLET-VISIBLE INTERFERENCE METHOD
CORL, EA
论文数:
0
引用数:
0
h-index:
0
CORL, EA
WIMPFHEIMER, H
论文数:
0
引用数:
0
h-index:
0
WIMPFHEIMER, H
[J].
SOLID-STATE ELECTRONICS,
1964,
7
(10)
: 755
-
&
[2]
IOTA, A NEW COMPUTER CONTROLLED THIN-FILM THICKNESS MEASUREMENT TOOL
KONNERTH, KL
论文数:
0
引用数:
0
h-index:
0
KONNERTH, KL
[J].
SOLID-STATE ELECTRONICS,
1972,
15
(04)
: 371
-
&
[3]
INTERSPECIMEN COMPARISON OF REFRACTIVE INDEX OF FUSED SILICA
MALITSON, IH
论文数:
0
引用数:
0
h-index:
0
MALITSON, IH
[J].
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA,
1965,
55
(10P1)
: 1205
-
&
[4]
Pliskin W. A., 1977, IBM Technical Disclosure Bulletin, V20, P1775
[5]
NONDESTRUCTIVE DETERMINATION OF THICKNESS + REFRACTIVE INDEX OF TRANSPARENT FILMS
PLISKIN, WA
论文数:
0
引用数:
0
h-index:
0
PLISKIN, WA
CONRAD, EE
论文数:
0
引用数:
0
h-index:
0
CONRAD, EE
[J].
IBM JOURNAL OF RESEARCH AND DEVELOPMENT,
1964,
8
(01)
: 43
-
&
[6]
PLISKIN WA, 1969, PHYSICAL MEASUREMENT, P1
[7]
PLISKIN WA, 1974, ELECTROCHEMICAL SOC, P91
[8]
PLISKIN WA, 1970, HDB THIN FILM TECHNO, pCH11
[9]
OPTICAL THICKNESS MEASUREMENT OF SIO2-SI3N4 FILMS ON SILICON
REIZMAN, F
论文数:
0
引用数:
0
h-index:
0
REIZMAN, F
VANGELDE.W
论文数:
0
引用数:
0
h-index:
0
VANGELDE.W
[J].
SOLID-STATE ELECTRONICS,
1967,
10
(07)
: 625
-
&
[10]
REFRACTIVE-INDEX DISPERSION IN SEMICONDUCTOR-RELATED THIN-FILMS
WARNECKE, AJ
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,SYST PROD DIV LAB,E FISHKILL FACIL,HOPEWELL JUNCTION,NY 12533
IBM CORP,SYST PROD DIV LAB,E FISHKILL FACIL,HOPEWELL JUNCTION,NY 12533
WARNECKE, AJ
LOPRESTI, PJ
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,SYST PROD DIV LAB,E FISHKILL FACIL,HOPEWELL JUNCTION,NY 12533
IBM CORP,SYST PROD DIV LAB,E FISHKILL FACIL,HOPEWELL JUNCTION,NY 12533
LOPRESTI, PJ
[J].
IBM JOURNAL OF RESEARCH AND DEVELOPMENT,
1973,
17
(03)
: 256
-
262
←
1
2
→