CHARACTERIZATION OF PULSED LASER DEPOSITED ZINC-OXIDE

被引:72
作者
IANNO, NJ [1 ]
MCCONVILLE, L [1 ]
SHAIKH, N [1 ]
PITTAL, S [1 ]
SNYDER, PG [1 ]
机构
[1] UNIV NEBRASKA,DEPT ENGN & MECH,LINCOLN,NE 68588
关键词
D O I
10.1016/0040-6090(92)90554-O
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The pulsed laser deposition of zinc oxide films (ZnO) has been studied as a function of laser wavelength, and substrate temperature. Optical emission spectroscopy of the laser produced plume was used to characterize the deposition process. The deposited films were characterized by X-ray diffractometry, Auger electron spectroscopy, and scanning electron microscopy. Highly textured (002) ZnO films deposited at substrate temperatures of 300-degrees-C with laser wavelengths of 532 nm and 248 nm. However, the energy fluence of 248 nm radiation controls the degree of texturing, allowing highly textured films to be deposited at room temperature.
引用
收藏
页码:92 / 99
页数:8
相关论文
共 15 条
[1]   PREPARATION OF ZINC-OXIDE FILMS BY THE THERMAL-DECOMPOSITION OF METALLO-ORGANIC COMPOUNDS [J].
JEAN, JH .
JOURNAL OF MATERIALS SCIENCE LETTERS, 1990, 9 (02) :127-129
[2]  
KELLY R, 1985, NUCL INSTRUM METH B, V9, P329, DOI 10.1016/0168-583X(85)90760-8
[3]   LASER SPUTTERING .3. THE MECHANISM OF THE SPUTTERING OF METALS LOW-ENERGY DENSITIES [J].
KELLY, R ;
ROTHENBERG, JE .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1985, 7-8 (MAR) :755-763
[4]   HEAT-TREATMENT EFFECTS OF ZNO-AL THIN-FILMS PREPARED BY FACING-TARGET-TYPE SPUTTERING METHOD [J].
KONISHI, R ;
NODA, K ;
SASAKURA, H .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1991, 30 (03) :567-568
[5]   ZINC-OXIDE THIN-FILMS PREPARED BY THE ELECTRON-CYCLOTRON-RESONANCE PLASMA SPUTTERING METHOD [J].
MANABE, Y ;
MITSUYU, T .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1990, 29 (02) :334-339
[6]   PREFERRED ORIENTATION OF ZNO FILMS CONTROLLED BY RF SPUTTERING [J].
MURTI, DK ;
BLUHM, TL .
THIN SOLID FILMS, 1982, 87 (01) :57-61
[7]   NEUTRAL PARTICLE-EMISSION FROM ZINC-OXIDE SURFACE INDUCED BY HIGH-DENSITY ELECTRONIC EXCITATION [J].
NAKAYAMA, T ;
ITOH, N ;
KAWAI, T ;
HASHIMOTO, K ;
SAKATA, T .
RADIATION EFFECTS LETTERS, 1982, 67 (05) :129-133
[8]  
OHJI K, 1978, J VAC SCI TECHNOL, V14, P1601
[9]   LASER SPUTTERING .2. THE MECHANISM OF THE SPUTTERING OF AL2O3 [J].
ROTHENBERG, JE ;
KELLY, R .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1984, 1 (2-3) :291-300
[10]  
WANG JS, 1982, P IEEE ULTR S, P480