DENSE-PLASMA PRODUCTION FOR HIGH-RATE SPUTTERING BY MEANS OF AN ELECTRIC MIRROR

被引：10

作者：

MATSUOKA, M

ONO, K

机构：

来源：

APPLIED PHYSICS LETTERS | 1988年 / 53卷 / 21期

关键词：

D O I：

10.1063/1.100310

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：2025 / 2027

页数：3

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