UNBALANCED POTENTIAL DISCHARGE CHARACTERISTICS FOR OPPOSED-TARGETS SPUTTERING SYSTEM

被引：4

作者：

MATSUOKA, M

HOSHI, Y

NAOE, M

机构：

[1] TOKYO INST POLYTECH, FAC ENGN, ATSUGI, KANAGAWA 24302, JAPAN

[2] TOKYO INST TECHNOL, FAC ENGN, MEGURO KU, TOKYO 152, JAPAN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 1987年 / 5卷 / 01期

关键词：

D O I：

10.1116/1.574136

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

收藏

页码：52 / 56

页数：5

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[3] PREPARATION OF BA-FERRITE FILMS FOR PERPENDICULAR MAGNETIC RECORDING BY RF TARGETS FACING TYPE OF SPUTTERING [J].

MATSUOKA, M ;

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YAMANAKA, S .

IEEE TRANSACTIONS ON MAGNETICS, 1984, 20 (05) :800-802

[4]

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[5] FACING TARGETS TYPE OF SPUTTERING METHOD FOR DEPOSITION OF MAGNETIC METAL-FILMS AT LOW-TEMPERATURE AND HIGH-RATE [J].

NAOE, M ;

YAMANAKA, SI ;

HOSHI, Y .

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