ELLIPSOMETRY AND CLEAN SURFACES OF SILICON AND GERMANIUM

[1] MEASUREMENT OF OXYGEN ADSORPTION ON SILICON BYELLIPSOMETRY [J]. JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1965, 26 (02) : 343 - &

[2] BOONSTRA AH, 1969, SURF SCI, V4, P141

[3] BOONSTRA AH, 1968, PHILIPS RES REPT S

[4] CALORIMETRIC STUDY OF ADSORPTION OF OXYGEN AND GASES HXA ON GERMANIUM AND SILICON [J]. SURFACE SCIENCE, 1969, 15 (02) : 340 - &

[5] ELLIPSOMETRIC INVESTIGATION OF PHYSISORPTION AT LOW TEMPERATURES [J]. SURFACE SCIENCE, 1969, 13 (01) : 110 - &

[6] ELLIPSOMETRY IN SUB-MONOLAYER REGION [J]. SURFACE SCIENCE, 1969, 14 (01) : 52 - &

[7] BORN M, 1965, PRINCIPLES OPTICS, P87

[8] Born M., 1965, PRINCIPLES OPTICS, P51

[9] ELECTRON SPIN RESONANCE IN AMORPHOUS SILICON, GERMANIUM, AND SILICON CARBIDE [J]. PHYSICAL REVIEW LETTERS, 1969, 23 (11) : 581 - &

[10] Adsorption of gases in multimolecular layers [J]. JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1938, 60 : 309 - 319

[1] MEASUREMENT OF OXYGEN ADSORPTION ON SILICON BYELLIPSOMETRY [J]. JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1965, 26 (02) : 343 - &

[2] BOONSTRA AH, 1969, SURF SCI, V4, P141

[3] BOONSTRA AH, 1968, PHILIPS RES REPT S

[4] CALORIMETRIC STUDY OF ADSORPTION OF OXYGEN AND GASES HXA ON GERMANIUM AND SILICON [J]. SURFACE SCIENCE, 1969, 15 (02) : 340 - &

[5] ELLIPSOMETRIC INVESTIGATION OF PHYSISORPTION AT LOW TEMPERATURES [J]. SURFACE SCIENCE, 1969, 13 (01) : 110 - &

[6] ELLIPSOMETRY IN SUB-MONOLAYER REGION [J]. SURFACE SCIENCE, 1969, 14 (01) : 52 - &

[7] BORN M, 1965, PRINCIPLES OPTICS, P87

[8] Born M., 1965, PRINCIPLES OPTICS, P51

[9] ELECTRON SPIN RESONANCE IN AMORPHOUS SILICON, GERMANIUM, AND SILICON CARBIDE [J]. PHYSICAL REVIEW LETTERS, 1969, 23 (11) : 581 - &

[10] Adsorption of gases in multimolecular layers [J]. JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1938, 60 : 309 - 319