EFFECTS OF HUMIDITY ON STRESS IN THIN SILICON DIOXIDE FILMS

被引：98

作者：

BLECH, I ^{[1
]}

COHEN, U ^{[1
]}

机构：

[1] TECHNION ISRAEL INST TECHNOL,DEPT MAT ENGN,IL-32000 HAIFA,ISRAEL

来源：

JOURNAL OF APPLIED PHYSICS | 1982年 / 53卷 / 06期

关键词：

D O I：

10.1063/1.331244

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：4202 / 4207

页数：6

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