X-RAY-LITHOGRAPHY USING BROAD-BAND SOURCES

[1] RADIATION FROM TWO-DIMENSIONAL MOLECULAR BOUND-STATES OF ELECTRONS CHANNELED IN DIAMOND [J]. PHYSICAL REVIEW LETTERS, 1982, 49 (03) : 215 - 218

[2] BETZ H, 1985, SEMICON EUROPA 85 TE, P67

[3] Burggraaf P., 1987, Semiconductor International, V10, P48

[4] THE CONTINUOUS X-RAY SPECTRUM FROM ELECTRON-OPAQUE TARGETS [J]. PROCEEDINGS OF THE PHYSICAL SOCIETY OF LONDON, 1959, 73 (474): : 924 - 936

[5] X-RAY-LITHOGRAPHY AT - 100-A LINEWIDTHS USING X-RAY MASKS FABRICATED BY SHADOWING TECHNIQUES [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1615 - 1619

[6] FONG LH, 1970, AUST J PHYS, V23, P17

[7] X-RAY LITHOGRAPHY .1. DESIGN CRITERIA FOR OPTIMIZING RESIST ENERGY-ABSORPTION .2. PATTERN REPLICATION WITH POLYMER MASKS [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) : 434 - 439

[8] COMPUTER-SIMULATIONS OF RESIST PROFILES IN X-RAY-LITHOGRAPHY [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 1254 - 1258

[9] JAEGER RP, 1984, P SOC PHOTO-OPT INST, V471, P110, DOI 10.1117/12.942336

[10] KREUZER JL, 1984, P SOC PHOTO-OPT INST, V471, P84, DOI 10.1117/12.942329

[1] RADIATION FROM TWO-DIMENSIONAL MOLECULAR BOUND-STATES OF ELECTRONS CHANNELED IN DIAMOND [J]. PHYSICAL REVIEW LETTERS, 1982, 49 (03) : 215 - 218

[2] BETZ H, 1985, SEMICON EUROPA 85 TE, P67

[3] Burggraaf P., 1987, Semiconductor International, V10, P48

[4] THE CONTINUOUS X-RAY SPECTRUM FROM ELECTRON-OPAQUE TARGETS [J]. PROCEEDINGS OF THE PHYSICAL SOCIETY OF LONDON, 1959, 73 (474): : 924 - 936

[5] X-RAY-LITHOGRAPHY AT - 100-A LINEWIDTHS USING X-RAY MASKS FABRICATED BY SHADOWING TECHNIQUES [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1615 - 1619

[6] FONG LH, 1970, AUST J PHYS, V23, P17

[7] X-RAY LITHOGRAPHY .1. DESIGN CRITERIA FOR OPTIMIZING RESIST ENERGY-ABSORPTION .2. PATTERN REPLICATION WITH POLYMER MASKS [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) : 434 - 439

[8] COMPUTER-SIMULATIONS OF RESIST PROFILES IN X-RAY-LITHOGRAPHY [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 1254 - 1258

[9] JAEGER RP, 1984, P SOC PHOTO-OPT INST, V471, P110, DOI 10.1117/12.942336

[10] KREUZER JL, 1984, P SOC PHOTO-OPT INST, V471, P84, DOI 10.1117/12.942329