COMPUTER-SIMULATIONS OF RESIST PROFILES IN X-RAY-LITHOGRAPHY

被引:34
作者
HEINRICH, K
BETZ, H
HEUBERGER, A
PONGRATZ, S
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 19卷 / 04期
关键词
D O I
10.1116/1.571255
中图分类号
O59 [应用物理学];
学科分类号
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页码:1254 / 1258
页数:5
相关论文
共 4 条
  • [1] CALCULATION OF THE OPTIMUM ELECTRON-ENERGY OF A DEDICATED STORAGE RING FOR X-RAY-LITHOGRAPHY
    BETZ, H
    FEY, FK
    HEUBERGER, A
    TISCHER, P
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1979, 26 (04) : 693 - 698
  • [2] MALDONADO JR, 1981, P INT C MICROLITHOGR
  • [3] SIMULATION OF X-RAY RESIST LINE EDGE PROFILES
    NEUREUTHER, AR
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03): : 1004 - 1008
  • [4] TISCHER P, 1978, 8TH P EL ION BEAM SC