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COMPUTER-SIMULATIONS OF RESIST PROFILES IN X-RAY-LITHOGRAPHY
被引:34
作者
:
HEINRICH, K
论文数:
0
引用数:
0
h-index:
0
HEINRICH, K
BETZ, H
论文数:
0
引用数:
0
h-index:
0
BETZ, H
HEUBERGER, A
论文数:
0
引用数:
0
h-index:
0
HEUBERGER, A
PONGRATZ, S
论文数:
0
引用数:
0
h-index:
0
PONGRATZ, S
机构
:
来源
:
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY
|
1981年
/ 19卷
/ 04期
关键词
:
D O I
:
10.1116/1.571255
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:1254 / 1258
页数:5
相关论文
共 4 条
[1]
CALCULATION OF THE OPTIMUM ELECTRON-ENERGY OF A DEDICATED STORAGE RING FOR X-RAY-LITHOGRAPHY
BETZ, H
论文数:
0
引用数:
0
h-index:
0
机构:
SIEMENS AG,FORSCHUNGSLAB,D-8000 MUNCHEN 83,FED REP GER
SIEMENS AG,FORSCHUNGSLAB,D-8000 MUNCHEN 83,FED REP GER
BETZ, H
FEY, FK
论文数:
0
引用数:
0
h-index:
0
机构:
SIEMENS AG,FORSCHUNGSLAB,D-8000 MUNCHEN 83,FED REP GER
SIEMENS AG,FORSCHUNGSLAB,D-8000 MUNCHEN 83,FED REP GER
FEY, FK
HEUBERGER, A
论文数:
0
引用数:
0
h-index:
0
机构:
SIEMENS AG,FORSCHUNGSLAB,D-8000 MUNCHEN 83,FED REP GER
SIEMENS AG,FORSCHUNGSLAB,D-8000 MUNCHEN 83,FED REP GER
HEUBERGER, A
TISCHER, P
论文数:
0
引用数:
0
h-index:
0
机构:
SIEMENS AG,FORSCHUNGSLAB,D-8000 MUNCHEN 83,FED REP GER
SIEMENS AG,FORSCHUNGSLAB,D-8000 MUNCHEN 83,FED REP GER
TISCHER, P
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1979,
26
(04)
: 693
-
698
[2]
MALDONADO JR, 1981, P INT C MICROLITHOGR
[3]
SIMULATION OF X-RAY RESIST LINE EDGE PROFILES
NEUREUTHER, AR
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV CALIF BERKELEY,ELECTR RES LAB,BERKELEY,CA 94720
UNIV CALIF BERKELEY,ELECTR RES LAB,BERKELEY,CA 94720
NEUREUTHER, AR
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1978,
15
(03):
: 1004
-
1008
[4]
TISCHER P, 1978, 8TH P EL ION BEAM SC
←
1
→
共 4 条
[1]
CALCULATION OF THE OPTIMUM ELECTRON-ENERGY OF A DEDICATED STORAGE RING FOR X-RAY-LITHOGRAPHY
BETZ, H
论文数:
0
引用数:
0
h-index:
0
机构:
SIEMENS AG,FORSCHUNGSLAB,D-8000 MUNCHEN 83,FED REP GER
SIEMENS AG,FORSCHUNGSLAB,D-8000 MUNCHEN 83,FED REP GER
BETZ, H
FEY, FK
论文数:
0
引用数:
0
h-index:
0
机构:
SIEMENS AG,FORSCHUNGSLAB,D-8000 MUNCHEN 83,FED REP GER
SIEMENS AG,FORSCHUNGSLAB,D-8000 MUNCHEN 83,FED REP GER
FEY, FK
HEUBERGER, A
论文数:
0
引用数:
0
h-index:
0
机构:
SIEMENS AG,FORSCHUNGSLAB,D-8000 MUNCHEN 83,FED REP GER
SIEMENS AG,FORSCHUNGSLAB,D-8000 MUNCHEN 83,FED REP GER
HEUBERGER, A
TISCHER, P
论文数:
0
引用数:
0
h-index:
0
机构:
SIEMENS AG,FORSCHUNGSLAB,D-8000 MUNCHEN 83,FED REP GER
SIEMENS AG,FORSCHUNGSLAB,D-8000 MUNCHEN 83,FED REP GER
TISCHER, P
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1979,
26
(04)
: 693
-
698
[2]
MALDONADO JR, 1981, P INT C MICROLITHOGR
[3]
SIMULATION OF X-RAY RESIST LINE EDGE PROFILES
NEUREUTHER, AR
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV CALIF BERKELEY,ELECTR RES LAB,BERKELEY,CA 94720
UNIV CALIF BERKELEY,ELECTR RES LAB,BERKELEY,CA 94720
NEUREUTHER, AR
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1978,
15
(03):
: 1004
-
1008
[4]
TISCHER P, 1978, 8TH P EL ION BEAM SC
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1
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