COMPOUND SEMICONDUCTOR ULTRATHIN FILMS - CHARACTERIZATION AND CONTROL OF GROWTH

被引:5
作者
INOUE, N
机构
[1] NTT LSI Laboratories, Atsugi, 243-01, 3-1, Morinosato-Wakamiya
关键词
D O I
10.1002/adma.19930050307
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
The unprecedented control of ultra-thin-film properties required by advanced device concepts has led to the development of novel tecliniques for both growth and characterization, including cathodoluminescence microscopy, scanning tunneling microscopy and in situ optical diagnostics. In situ electron microscopy can be used to directly observe transient growth processes, revealing unexpected features such as the lateral growth of Ga layers around droplets when the surrounding surface is covered with As (Figure).
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页码:192 / 197
页数:6
相关论文
共 22 条
[1]   LUMINESCENCE IN SCANNING TUNNELING MICROSCOPY ON III-V NANOSTRUCTURES [J].
ALVARADO, SF ;
RENAUD, P ;
ABRAHAM, DL ;
SCHONENBERGER, C ;
ARENT, DJ ;
MEIER, HP .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (02) :409-413
[2]   ANISOTROPIES IN THE ABOVE BAND-GAP OPTICAL-SPECTRA OF CUBIC SEMICONDUCTORS [J].
ASPNES, DE ;
STUDNA, AA .
PHYSICAL REVIEW LETTERS, 1985, 54 (17) :1956-1959
[3]   MIGRATION-ENHANCED EPITAXY OF GAAS AND ALGAAS [J].
HORIKOSHI, Y ;
KAWASHIMA, M ;
YAMAGUCHI, H .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1988, 27 (02) :169-179
[4]   MBE MONOLAYER GROWTH-CONTROL BY INSITU ELECTRON-MICROSCOPY [J].
INOUE, N .
JOURNAL OF CRYSTAL GROWTH, 1991, 111 (1-4) :75-82
[5]  
INOUE N, IN PRESS J CRYST GRO
[6]  
JOYCE BA, 1989, ADV MATER, V1, P270
[7]   OPTICAL INVESTIGATION ON THE GROWTH-PROCESS OF GAAS DURING MIGRATION-ENHANCED EPITAXY [J].
KOBAYASHI, N ;
HORIKOSHI, Y .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1989, 28 (11) :L1880-L1882
[8]  
KOBAYASHI N, 1990, JPN J APPL PHYS, V29, pL334
[9]  
MURASHITA T, IN PRESS APPL SURF S
[10]  
NODA T, 1990, J CRYST GROWTH, V111, P259