PROFILE ESTIMATION OF HIGH-CONCENTRATION ARSENIC DIFFUSIONS IN SILICON

被引：30

作者：

FAIR, RB

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1972年 / 43卷 / 03期

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D O I：

10.1063/1.1661253

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：1278 / &

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