EFFECT OF ADSORBED MATTER ON INTENSE PULSED ION-BEAM GENERATION

被引：9

作者：

HASHIMOTO, Y

YATSUZUKA, M

NOBUHARA, S

机构：

[1] Department of Electrical Engineering, Himeji Institute of Technology, Himeji, Hyogo, 671-22

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1993年 / 32卷 / 10期

关键词：

HIGH-PURITY ION BEAMS; INTENSE PULSED ION BEAMS; PULSE POWER GENERATOR; INVERSE PINCH ION DIODE; ADSORBED MATTER;

D O I：

10.1143/JJAP.32.4838

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Generation of intense pulsed ion beams with high purity has been studied experimentally. Impurity ions in the ion beams were found to be caused by adsorbed matter on the anode and residual gas molecules in the diode chamber. The first few shots without breaking vacuum in the diode chamber were found to be effective to remove the adsorbed matter on the anode, and lead to higher purity of the ion beams. No effect on the ion beam current was observed upon changing the residual gas pressure in the range from 10(-2) to 10(-3) Pa or upon leaving the anode in atmosphere for approximately 10 h. Residual gas molecules in the diode chamber had little effect on the purity of the ion beams. After the first 5 shots, the current of the ion beams was found to be 3.0 kA. The most dominant species in the ion beams was F2+.

引用

收藏

页码：4838 / 4844

页数：7

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