POLYCRYSTALLINE CVD DIAMOND FILMS WITH HIGH ELECTRICAL MOBILITY

被引:28
作者
PLANO, MA
LANDSTRASS, MI
PAN, LS
HAN, S
KANIA, DR
MCWILLIAMS, S
AGER, JW
机构
[1] LAWRENCE BERKELEY LAB, BERKELEY, CA 94720 USA
[2] LAWRENCE LIVERMORE NATL LAB, LIVERMORE, CA 94550 USA
关键词
D O I
10.1126/science.260.5112.1310
中图分类号
O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];
学科分类号
07 ; 0710 ; 09 ;
摘要
Advances in the deposition process have led to dramatic improvements in the electronic properties of polycrystalline diamond films produced by chemical vapor deposition (CVD). It is now possible to produce CVD diamond with properties approaching those of IIa natural diamonds. The combined electron-hole mobility, as measured by transient photoconductivity at low carrier density, is 4000 square centimeters per volt per second at an electric field of 200 volts per centimeter and is comparable to that of the best single-crystal IIa natural diamonds. Carrier lifetimes measured under the same conditions are 150 picoseconds for the CVD diamond and 300 picoseconds for single-crystal diamond. The collection distance at a field of 10 kilovolts per centimeter is 15 micrometers for the CVD diamond as compared to 30 micrometers for natural diamonds. The electrical qualities appear to correlate with the width of the diamond Raman peak. Also, although the collection distance at the highest fields in the films nearly equals the average grain size, there is no evidence of deleterious grain boundary effects.
引用
收藏
页码:1310 / 1312
页数:3
相关论文
共 20 条
[1]   SPATIALLY RESOLVED RAMAN STUDIES OF DIAMOND FILMS GROWN BY CHEMICAL VAPOR-DEPOSITION [J].
AGER, JW ;
VEIRS, DK ;
ROSENBLATT, GM .
PHYSICAL REVIEW B, 1991, 43 (08) :6491-6499
[2]   DIAMOND ELECTRONIC DEVICES - A CRITICAL-APPRAISAL [J].
COLLINS, AT .
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1989, 4 (08) :605-611
[3]   FRACTURE-TOUGHNESS OF CHEMICALLY VAPOR-DEPOSITED DIAMOND [J].
DRORY, MD ;
GARDINIER, CF ;
SPECK, JS .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1991, 74 (12) :3148-3150
[4]   DEVICE APPLICATIONS OF DIAMONDS [J].
GEIS, MW ;
EFREMOW, NN ;
RATHMAN, DD .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (03) :1953-1954
[5]   HIGH-TEMPERATURE POINT-CONTACT TRANSISTORS AND SCHOTTKY DIODES FORMED ON SYNTHETIC BORON-DOPED DIAMOND [J].
GEIS, MW ;
RATHMAN, DD ;
EHRLICH, DJ ;
MURPHY, RA ;
LINDLEY, WT .
IEEE ELECTRON DEVICE LETTERS, 1987, 8 (08) :341-343
[6]   DIAMOND TRANSISTOR PERFORMANCE AND FABRICATION [J].
GEIS, MW .
PROCEEDINGS OF THE IEEE, 1991, 79 (05) :669-676
[7]  
GEIS MW, 1988, SDIO IST ONR DIAMOND, pW15
[8]   HIGH-TEMPERATURE SCHOTTKY DIODES WITH THIN-FILM DIAMOND BASE [J].
GILDENBLAT, GS ;
GROT, SA ;
HATFIELD, CW ;
BADZIAN, AR ;
BADZIAN, T .
IEEE ELECTRON DEVICE LETTERS, 1990, 11 (09) :371-372
[9]   THE ELECTRICAL-PROPERTIES AND DEVICE APPLICATIONS OF HOMOEPITAXIAL AND POLYCRYSTALLINE DIAMOND FILMS [J].
GILDENBLAT, GS ;
GROT, SA ;
BADZIAN, A .
PROCEEDINGS OF THE IEEE, 1991, 79 (05) :647-668
[10]   UNUSUALLY HIGH THERMAL-CONDUCTIVITY IN DIAMOND FILMS [J].
GRAEBNER, JE ;
JIN, S ;
KAMMLOTT, GW ;
HERB, JA ;
GARDINIER, CF .
APPLIED PHYSICS LETTERS, 1992, 60 (13) :1576-1578