100 KV GHOST ELECTRON-BEAM PROXIMITY CORRECTION ON TUNGSTEN X-RAY MASKS

被引：4

作者：

GESLEY, MA ^{[1
]}

MCCORD, MA ^{[1
]}

机构：

[1] IBM CORP,CTR SEMICOND RES & DEV,YORKTOWN HTS,NY 10598

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1994年 / 12卷 / 06期

关键词：

D O I：

10.1116/1.587535

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：3478 / 3482

页数：5

共 15 条

[1] ELECTRON-BEAM LITHOGRAPHY USING MEBES-IV [J].

ABBOUD, F ;

GESLEY, M ;

COLBY, D ;

COMENDANT, K ;

DEAN, R ;

ECKES, W ;

MCCLURE, D ;

PEARCEPERCY, H ;

PRIOR, R ;

WATSON, S .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1992, 10 (06) :2734-2742

[2] STUDY OF ELECTRON-BEAM PATTERNING OF RESIST ON TUNGSTEN X-RAY MASKS [J].

CUMMINGS, KD ;

RESNICK, DJ ;

FRACKOVIAK, J ;

KOLA, RR ;

TRIMBLE, LE ;

GRANT, B ;

SILVERMAN, S ;

HAAS, L ;

JENNINGS, B .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (06) :2872-2875

[3] EXACT SOLUTION OF THE PROXIMITY EFFECT EQUATION BY A SPLITTING METHOD [J].

GERBER, PD .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (01) :432-435

[4] 100 KV FIELD-EMISSION ELECTRON OPTICS FOR NANOLITHOGRAPHY [J].

GESLEY, M .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1992, 10 (06) :2451-2458

[5] EFFICIENCY OF ELECTRON-BEAM PROXIMITY EFFECT CORRECTION [J].

GROVES, TR .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (06) :2746-2753

[6] TUNGSTEN PATTERNING FOR 1-1 X-RAY MASKS [J].

JURGENSEN, CW ;

KOLA, RR ;

NOVEMBRE, AE ;

TAI, WW ;

FRACKOVIAK, J ;

TRIMBLE, LE ;

CELLER, GK .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (06) :3280-3286

[7]

KERN DP, 1980, 9TH P S EL ION BEAM, V80, P326

[8]

LEEN TK, 1989, J APPL PHYS, V65, P448

[9] 100 KV THERMAL FIELD-EMISSION ELECTRON-BEAM LITHOGRAPHY TOOL FOR HIGH-RESOLUTION X-RAY MASK PATTERNING [J].

MCCORD, MA ;

VISWANATHAN, R ;

HOHN, FJ ;

WILSON, AD ;

NAUMANN, R ;

NEWMAN, TH .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1992, 10 (06) :2764-2770

[10] RESOLUTION LIMITS AND PROCESS LATITUDE OF X-RAY MASK FABRICATION [J].

MCCORD, MA ;

WAGNER, A ;

DONOHUE, T .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (06) :2958-2963

← 1 2 →