ELECTRICAL CHARACTERIZATION OF TI SCHOTTKY BARRIERS ON N-TYPE GAN

被引:100
作者
BINARI, SC
DIETRICH, HB
KELNER, G
ROWLAND, LB
DOVERSPIKE, K
GASKILL, DK
机构
[1] Naval Research Laboratory, Washington DC
关键词
SEMICONDUCTOR DEVICE CHARACTERIZATION; SCHOTTKY-BARRIER DIODES;
D O I
10.1049/el:19940565
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The Schottky barrier height of Ti on n-type GaN has been measured to be 0.58 and 0.59eV by capacitance-voltage and current-voltage techniques, respectively. This work is of particular interest because it is the first measure of the Schottky barrier height on GaN for a metal other than Au. The barrier height of Ti on GaN is significantly less than that of Au. This supports the prediction that the Fermi level is not pinned at the GaN surface.
引用
收藏
页码:909 / 911
页数:3
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