SIMULATION OF DRY ETCHED LINE EDGE PROFILES

被引：24

作者：

REYNOLDS, JL ^{[1
]}

NEUREUTHER, AR ^{[1
]}

OLDHAM, WG ^{[1
]}

机构：

[1] UNIV CALIF BERKELEY,ELECTR RES LAB,BERKELEY,CA 94720

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1979年 / 16卷 / 06期

关键词：

D O I：

10.1116/1.570291

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1772 / 1775

页数：4

共 11 条

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