Exposure of Cs surfaces to O2 causes ejection of O- ions with low yields (approximately 10(-8) per incident O2 molecule) during the first stages of dissociative chemisorption (followed by exoelectron emission at higher exposures), although the work function of the surface exceeds the electron affinity of O and the energetics of the overall reaction is almost zero. A mechanism is proposed whereafter the release of O- is a consequence of strong repulsion in O-2(2-) species intermediately formed in front of the surface.
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页码:1331 / 1334
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BOTTCHER A, 1991, J CHEM PHYS, V95, P3756, DOI 10.1063/1.460826