O- ESCAPE DURING THE OXIDATION OF CESIUM

被引:66
作者
GREBER, T [1 ]
GROBECKER, R [1 ]
MORGANTE, A [1 ]
BOTTCHER, A [1 ]
ERTL, G [1 ]
机构
[1] TASC,I-24012 TRIESTE,ITALY
关键词
D O I
10.1103/PhysRevLett.70.1331
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Exposure of Cs surfaces to O2 causes ejection of O- ions with low yields (approximately 10(-8) per incident O2 molecule) during the first stages of dissociative chemisorption (followed by exoelectron emission at higher exposures), although the work function of the surface exceeds the electron affinity of O and the energetics of the overall reaction is almost zero. A mechanism is proposed whereafter the release of O- is a consequence of strong repulsion in O-2(2-) species intermediately formed in front of the surface.
引用
收藏
页码:1331 / 1334
页数:4
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