LARGE AREA DEPOSITION OF AMORPHOUS-SILICON

被引:6
作者
MATSUMURA, M
UCHIDA, Y
机构
来源
JOURNAL DE PHYSIQUE | 1981年 / 42卷 / NC4期
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D O I
10.1051/jphyscol:19814148
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页码:671 / 674
页数:4
相关论文
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[2]   SILANE DISSOCIATION MECHANISMS AND THIN-FILM FORMATION IN A LOW-PRESSURE MULTIPOLE DC DISCHARGE [J].
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APPLIED PHYSICS LETTERS, 1980, 37 (07) :646-648
[3]  
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[4]   GLOW-DISCHARGE PREPARATION OF AMORPHOUS HYDROGENATED SILICON FROM HIGHER SILANES [J].
SCOTT, BA ;
BRODSKY, MH ;
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PLECENIK, RM ;
SIMONYI, EE .
APPLIED PHYSICS LETTERS, 1980, 37 (08) :725-727