LOW-ENERGY ELECTRON-IRRADIATION OF SI-SIO2 INTERFACE

被引：18

作者：

PEPPER, M ^{[1
]}

机构：

[1] PLESSEY CO LTD,ALLEN CLARK RES CTR,TOWCESTER,NORTHAMPTONSHIR,ENGLAND

来源：

THIN SOLID FILMS | 1972年 / 14卷 / 01期

关键词：

D O I：

10.1016/0040-6090(72)90382-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：S7 / S10

页数：4

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