TEXTURE OF OBLIQUELY SPUTTERED ZNO THIN-FILMS

A series of ZnO polycrystalline thin films were prepared on Si(100)/SiO2/TiN substrates by radio frequency (RF) sputtering at various angles between the sputter direction and the substrate normal. The X-ray diffraction theta/2theta scans confirmed the expected c-orientation of the films, depending at some extent on the angle of sputtering. The limited pole figures, obtained by rocking-curve measurement, show a slight deviation of the texture axis from the substrate normal direction, which increase with the sputtering angle. The texture axis is inclined not toward the sputtering direction, as was expected, but quite opposite.