INFLUENCE OF GROWTH-CONDITIONS ON THE PHOTOLUMINESCENCE OF PSEUDOMORPHIC MBE GROWN SI1-XGEX QUANTUM-WELLS

被引:8
作者
BRUNNER, J
MENCZIGAR, U
GAIL, M
FRIESS, E
ABSTREITER, G
机构
[1] Walter Schottky Institut, Am Coulombwall
关键词
D O I
10.1016/0022-0248(93)90657-I
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
The influence of growth conditions on the photoluminescence of SiGe quantum wells is presented. Growth temperatures above 600-degrees-C are found to be a prerequisite for a good layer quality. The variation of growth rates between 0.25 and 1 angstrom/s, however, has no significant effect on the spectra. With optimized growth conditions, strong excitonic dominated quantum well luminescence with line widths below 5 meV has been achieved.
引用
收藏
页码:443 / 446
页数:4
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