ELECTROFORMING AND DIELECTRIC BREAKDOWN IN THIN ALUMINUM-OXIDE FILMS

被引：18

作者：

MORGAN, DV ^{[1
]}

HOWES, MJ ^{[1
]}

POLLARD, RD ^{[1
]}

WATERS, DGP ^{[1
]}

机构：

[1] UNIV LEEDS,DEPT ELECT & ELECTR ENG,LEEDS,YORKSHIRE,ENGLAND

来源：

THIN SOLID FILMS | 1973年 / 15卷 / 01期

关键词：

D O I：

10.1016/0040-6090(73)90210-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：123 / 131

页数：9

共 18 条

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[3]

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[4]

CACHARD A, 1971, CR ACAD SCI B PHYS, V272, P859

[5] ELECTRICAL PHENOMENA IN AMORPHOUS OXIDE FILMS [J].

DEARNALEY, G ;

STONEHAM, AM ;

MORGAN, DV .

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[6]

Dearnaley G., 1970, Journal of Non-Crystalline Solids, V4, P593, DOI 10.1016/0022-3093(70)90097-9

[7] LOW-FREQUENCY NEGATIVE RESISTANCE IN THIN ANODIC OXIDE FILMS [J].

HICKMOTT, TW .

JOURNAL OF APPLIED PHYSICS, 1962, 33 (09) :2669-&

[8] POTENTIAL DISTRIBUTION + NEGATIVE RESISTANCE IN THIN OXIDE FILMS [J].

HICKMOTT, TW .

JOURNAL OF APPLIED PHYSICS, 1964, 35 (09) :2679-&

[9]

HICKMOTT TW, 1970, PERSONAL COMMUNICATI

[10] ELECTRICAL PULSE BREAKDOWN OF SILICON OXIDE FILMS [J].

KLEIN, N ;

BURSTEIN, E .

JOURNAL OF APPLIED PHYSICS, 1969, 40 (07) :2728-+

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