LOCAL STOICHIOMETRY AND ATOMIC INTERDIFFUSION DURING REACTIVE METAL MERCURY-CADMIUM-TELLURIDE JUNCTION FORMATION

被引：24

作者：

WALL, A ^{[1
]}

RAISANEN, A ^{[1
]}

CHANG, S ^{[1
]}

PHILIP, P ^{[1
]}

TROULLIER, N ^{[1
]}

FRANCIOSI, A ^{[1
]}

PETERMAN, DJ ^{[1
]}

机构：

[1] MCDONNELL DOUGLAS CORP,RES LABS,ST LOUIS,MO 63166

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1987年 / 5卷 / 05期

关键词：

D O I：

10.1116/1.574836

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：3193 / 3197

页数：5

共 20 条

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