EFFECTS OF FILAMENT AND REACTOR WALL MATERIALS IN LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION SYNTHESIS OF DIAMOND

被引：46

作者：

SINGH, B

ARIE, Y

LEVINE, AW

MESKER, OR

机构：

来源：

APPLIED PHYSICS LETTERS | 1988年 / 52卷 / 06期

关键词：

D O I：

10.1063/1.99440

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：451 / 452

页数：2

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