SILICON CONTAINING PHOTORESISTS FOR HALF MICRON LITHOGRAPHY

被引:7
作者
SEZI, R
SEBALD, M
LEUSCHNER, R
机构
关键词
D O I
10.1002/pen.760291313
中图分类号
TQ [化学工业];
学科分类号
0817 ;
摘要
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页码:891 / 894
页数:4
相关论文
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