AN ON-DEMAND BEAM DEFLECTION SYSTEM FOR MICROBEAM PIXE ANALYSIS

被引：20

作者：

TEESDALE, WJ

CAMPBELL, JL

机构：

[1] Guelph-Waterloo Program for Graduate Work in Physics, University of Guelph, Guelph

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1990年 / 52卷 / 01期

关键词：

D O I：

10.1016/0168-583X(90)90607-V

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

A symmetric on-demand beam deflector for use in conjunction with particle microbeams is described. Tests of the device in a micro-PIXE system with a 3 μm width beam indicate that the position and dimensions of the microbeam are not significantly altered. Measurement of beam charge is accomplished either by conventional integration or by recording RBS spectra from vanes rotating through the beam; careful attention to dead time is necessary in the latter case. In micro-PIXE reduction of specimen damage by the beam deflector is of considerable value. © 1990.

引用

收藏

页码：93 / 97

页数：5

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