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Helium scattering from O on Rh(111): Scattering cross sections and adsorption kinetics
被引:13
作者:
Peterlinz, KA
Sibener, SJ
机构:
[1] UNIV CHICAGO, JAMES FRANCK INST, CHICAGO, IL 60637 USA
[2] UNIV CHICAGO, DEPT CHEM, CHICAGO, IL 60637 USA
基金:
美国国家科学基金会;
关键词:
adsorption isotherms;
adsorption kinetics;
atom solid interactions;
atom solid scattering and diffraction elastic;
chemisorption;
rhodium;
D O I:
10.1016/0039-6028(95)01007-6
中图分类号:
O64 [物理化学(理论化学)、化学物理学];
学科分类号:
070304 ;
081704 ;
摘要:
He diffraction and specular He scattering measurements of O on Rh(111) were made for T-S=125-625 K and theta(O)=0.0-0.50 ML. For T-S>450 K and theta(O)<0.21 ML, specular He scattering from the O/Rh(111) overlayer is well described by a model for disordered adsorbates, with a cross section of 62.6 Angstrom(2) for 63 meV He. At higher coverages, these measurements reveal a complex relationship between coverage, temperature, and the ordered overlayer structures for O/Rh(111). In addition, adsorption isotherms presented here show second order Langmuir adsorption kinetics for O-2 on Rh(111) and a sticking coefficient of about 5% for O-2 on 525 K Rh(111).
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页码:L1239 / L1244
页数:6
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