INVESTIGATION OF THIN-FILM NI/SINGLE-CRYSTAL SIC INTERFACE REACTION

被引：50

作者：

OHDOMARI, I ^{[1
]}

SHA, S ^{[1
]}

AOCHI, H ^{[1
]}

CHIKYOW, T ^{[1
]}

机构：

[1] ADV MAT LAB INC,SAITAMA 340,JAPAN

来源：

JOURNAL OF APPLIED PHYSICS | 1987年 / 62卷 / 09期

关键词：

D O I：

10.1063/1.339259

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3747 / 3750

页数：4

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