HIGH CRITICAL CURRENT DENSITIES IN YBA2CU3O7-X THIN-FILMS FORMED BY METALORGANIC CHEMICAL VAPOR-DEPOSITION AT 730-DEGREES-C

被引:45
作者
LI, YQ [1 ]
ZHAO, J [1 ]
CHERN, CS [1 ]
HUANG, W [1 ]
KULESHA, GA [1 ]
LU, P [1 ]
GALLOIS, B [1 ]
NORRIS, P [1 ]
KEAR, B [1 ]
COSANDEY, F [1 ]
机构
[1] EMCORE CORP,SOMERSET,NJ 08873
关键词
D O I
10.1063/1.104557
中图分类号
O59 [应用物理学];
学科分类号
摘要
YBa2Cu3O7-x superconducting thin films with a critical current density of 2.3 x 10(6) A/cm2 at 77.7 K and 0 T were prepared by a metalorganic chemical vapor deposition process. The films were formed in situ on LaAlO3 at a substrate temperature of 730-degrees-C in 2 Torr partial pressure of N2O. Resistivity and magnetic susceptibility measurements of the as-deposited films show a sharp superconducting transition temperature of 89 K with a narrow width of less than 1 K. Critical current densities were measured by the dc transport method with a patterned bridge of 120-mu-m x 40-mu-m. Both x-ray diffraction and high-resolution electron microscopy measurements indicate that films grew epitaxially with the c axis perpendicular to the surface of the substrate.
引用
收藏
页码:648 / 650
页数:3
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共 20 条
  • [11] PROCESSING TECHNIQUES FOR THE 93-K SUPERCONDUCTOR BA2YCU3O7
    MURPHY, DW
    JOHNSON, DW
    JIN, S
    HOWARD, RE
    [J]. SCIENCE, 1988, 241 (4868) : 922 - 930
  • [12] SCHUEGRAF KK, 1988, HDB THIN FILM DEPOSI, P276
  • [13] TSURUOKA T, 1989, JPN J APPL PHYS, V28, P607
  • [14] HIGH CRITICAL CURRENTS IN EPITAXIAL YBA2CU3O7-X THIN-FILMS ON SILICON WITH BUFFER LAYERS
    WU, XD
    INAM, A
    HEGDE, MS
    WILKENS, B
    CHANG, CC
    HWANG, DM
    NAZAR, L
    VENKATESAN, T
    MIURA, S
    MATSUBARA, S
    MIYASAKA, Y
    SHOHATA, N
    [J]. APPLIED PHYSICS LETTERS, 1989, 54 (08) : 754 - 756
  • [15] HIGH CRITICAL-CURRENT DENSITY OF Y-BA-CU-O SUPERCONDUCTING FILMS PREPARED BY CVD
    YAMANE, H
    KUROSAWA, H
    HIRAI, T
    WATANABE, K
    IWASAKI, H
    KOBAYASHI, N
    MUTO, Y
    [J]. SUPERCONDUCTOR SCIENCE & TECHNOLOGY, 1989, 2 (02) : 115 - 117
  • [16] Y-BA-CU-O SUPERCONDUCTING FILMS PREPARED ON SRTIO3 SUBSTRATES BY CHEMICAL VAPOR-DEPOSITION
    YAMANE, H
    MASUMOTO, H
    HIRAI, T
    IWASAKI, H
    WATANABE, K
    KOBAYASHI, N
    MUTO, Y
    KUROSAWA, H
    [J]. APPLIED PHYSICS LETTERS, 1988, 53 (16) : 1548 - 1550
  • [17] VUV FLUORESCENCE FOLLOWING PHOTO-DISSOCIATION OF N2O AT 193 NM
    ZAVELOVICH, J
    ROTHSCHILD, M
    GORNIK, W
    RHODES, CK
    [J]. JOURNAL OF CHEMICAL PHYSICS, 1981, 74 (12) : 6787 - 6791
  • [18] DEPOSITION OF HIGH-TC SUPERCONDUCTING Y-BA-CU-O THIN-FILMS AT LOW-TEMPERATURES USING A PLASMA-ENHANCED ORGANOMETALLIC CHEMICAL VAPOR-DEPOSITION APPROACH
    ZHAO, J
    MARCY, HO
    TONGE, LM
    WESSELS, BW
    MARKS, TJ
    KANNEWURF, CR
    [J]. SOLID STATE COMMUNICATIONS, 1990, 74 (10) : 1091 - 1094
  • [19] ORGANOMETALLIC CHEMICAL VAPOR-DEPOSITION OF HIGH-TC SUPERCONDUCTING FILMS USING A VOLATILE, FLUOROCARBON-BASED PRECURSOR
    ZHAO, J
    DAHMEN, KH
    MARCY, HO
    TONGE, LM
    MARKS, TJ
    WESSELS, BW
    KANNEWURF, CR
    [J]. APPLIED PHYSICS LETTERS, 1988, 53 (18) : 1750 - 1752
  • [20] LOW-TEMPERATURE INSITU FORMATION OF Y-BA-CU-O HIGH-TC SUPERCONDUCTING THIN-FILMS BY PLASMA-ENHANCED METALORGANIC CHEMICAL VAPOR-DEPOSITION
    ZHAO, J
    NOH, DW
    CHERN, C
    LI, YQ
    NORRIS, P
    GALLOIS, B
    KEAR, B
    [J]. APPLIED PHYSICS LETTERS, 1990, 56 (23) : 2342 - 2344