SURFACE-STRUCTURE OF O(+)-ION-IMPLANTED SILICA GLASS

被引:5
作者
FUKUMI, K
CHAYAHARA, A
HAYAKAWA, J
SATOU, M
机构
[1] Government Industrial Research Institute Osaka, 563, 1-8-31, Midorigaoka, Ikeda-shi, Osaka-fu
关键词
D O I
10.1016/0022-3093(91)90504-Y
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The surface structure of 2 MeV O+-ion-implanted silica glass has been investigated by the X-ray diffraction method and the spectroscopic method. It is found that the refractive index and density of the surface layer increases and decreases by 1% and 2.5% with the O+-ion implantation, respectively. It is inferred that silicon ions are coordinated by four oxygen ions in the surface damaged layer of the glass. The Si-O-Si bond angle decreases and the middle range ordering reduces with O+-ion-implantation. It is deduced that the surface structure of the ion-implanted silica glass is similar to that of neutron irradiated silica glass.
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页码:126 / 132
页数:7
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