STOCHASTIC-MODEL FOR THIN-FILM GROWTH AND EROSION

被引：86

作者：

STEARNS, DG

机构：

[1] University of California, Lawrence Livermore National Laboratory, Livermore, CA 94550

来源：

APPLIED PHYSICS LETTERS | 1993年 / 62卷 / 15期

关键词：

D O I：

10.1063/1.109593

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A linearized, stochastic theory of thin film growth and erosion is presented to describe the evolution of surface roughness in the case of good layer formation far from equilibrium, as is generally found in energetic growth techniques such as ion-assisted vapor deposition. The variation of the power spectral density and root-mean-square roughness is studied for growth on smooth and rough substrates.

引用

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页码：1745 / 1747

页数：3

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