PLASMA SILICON-OXIDE FILMS ON GARNET SUBSTRATES - MEASUREMENT OF THEIR THICKNESS AND REFRACTIVE-INDEX BY THE PRISM COUPLING TECHNIQUE

被引：15

作者：

HOU, TW

MOGAB, CJ

机构：

来源：

APPLIED OPTICS | 1981年 / 20卷 / 18期

关键词：

D O I：

10.1364/AO.20.003184

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：3184 / 3188

页数：5

共 14 条

[1] EVALUATION OF THE PRISM COUPLER FOR MEASURING THE THICKNESS AND REFRACTIVE-INDEX OF DIELECTRIC FILMS ON SILICON SUBSTRATES [J].

ADAMS, AC ;

SCHINKE, DP ;

CAPIO, CD .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (09) :1539-1543

[2] REFRACTIVE-INDEX OF A NATIVE OXIDE ANODICALLY GROWN ON GAAS [J].

BARNES, PA ;

SCHINKE, DP .

APPLIED PHYSICS LETTERS, 1977, 30 (01) :26-28

[3] DESIGN AND DEVELOPMENT OF SINGLE-LAYER, ION-IMPLANTABLE SMALL BUBBLE MATERIALS FOR MAGNETIC-BUBBLE DEVICES [J].

BLANK, SL ;

WOLFE, R ;

LUTHER, LC ;

LECRAW, RC ;

NELSON, TJ ;

BIOLSI, WA .

JOURNAL OF APPLIED PHYSICS, 1979, 50 (03) :2155-2160

[4]

BORN M, 1965, PRINCIPLES OPTICS, P62

[5] DEPOSITION OF PLASMA SILICON-OXIDE THIN-FILMS IN A PRODUCTION PLANAR REACTOR [J].

HOLLAHAN, JR .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (06) :930-934

[6]

HOU TW, UNPUBLISHED

[7]

KERSTEN RT, 1975, OPT ACTA, V22, P503, DOI 10.1080/713819078

[8] DESIGN OF BUBBLE DEVICE ELEMENTS EMPLOYING ION-IMPLANTED PROPAGATION PATTERNS [J].

NELSON, TJ ;

WOLFE, R ;

BLANK, SL ;

BONYHARD, PI ;

JOHNSON, WA ;

ROMAN, BJ ;

VELLACOLEIRO, GP .

BELL SYSTEM TECHNICAL JOURNAL, 1980, 59 (02) :229-257

[9] CHARACTERIZATION OF SILICON LAYERS VIA GUIDED WAVE OPTICS [J].

OLIVIER, M ;

PEUZIN, JC .

APPLIED PHYSICS LETTERS, 1978, 32 (06) :386-388

[10]

SCHINKE DP, 1977, JUN C LAS ENG APPL W

← 1 2 →