ULTRA-THIN FILM GROWTH OF PD BY RADICAL ENHANCED VAPOR-DEPOSITION

被引：2

作者：

FUJIMOTO, T

KOJIMA, I

机构：

[1] National Institute of Materials and Chemical Research, Tsukuba, Ibaraki, 305

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1995年 / 34卷 / 5A期

关键词：

THIN FILM; RADICAL ENHANCED VAPOR DEPOSITION; OXYGEN RADICAL; PALLADIUM; FILM GROWTH SCANNING TUNNELING MICROSCOPE;

D O I：

10.1143/JJAP.34.2461

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The vapor deposition of Pd on graphite was carried out in an oxygen radical atmosphere, and resulting surfaces were analyzed by an Auger electron microprobe and a scanning tunneling microscope. In contrast with deposition under oxygen atmosphere or under vacuum, coexistence of the oxygen radical during deposition enabled the Pd to form an ultra thin film whose thickness was 0.6 nm.

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页码：2461 / 2462

页数：2

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