PHOTOREFLECTANCE OF GAAS AND GA0.82AL0.18AS AT ELEVATED-TEMPERATURES UP TO 600-DEGREE-C

被引：80

作者：

SHEN, H

PAN, SH

HANG, Z

LENG, J

POLLAK, FH

WOODALL, JM

SACKS, RN

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

[2] UNITED TECHNOL RES CTR,E HARTFORD,CT 06108

来源：

APPLIED PHYSICS LETTERS | 1988年 / 53卷 / 12期

关键词：

D O I：

10.1063/1.100027

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1080 / 1082

页数：3

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