DETERMINATION OF THE TEMPERATURE-DEPENDENCE OF THE FREE CARRIER AND INTERBAND ABSORPTION IN SILICON AT 1.06 MU-M

被引:62
作者
SVANTESSON, KG
NILSSON, NG
机构
[1] Physics Department, Royal Institute of Technology
来源
JOURNAL OF PHYSICS C-SOLID STATE PHYSICS | 1979年 / 12卷 / 18期
关键词
D O I
10.1088/0022-3719/12/18/029
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Simultaneous determinations of the free-carrier absorption cross-section, the interband absorption coefficient, and the surface reflectivity, at the Nd:YAG laser wavelength 1.06 mu m and in the temperature interval 195-372K are reported, using a method developed previously. The influence of the free-carrier absorption is described by an analytical model which fits the experimental data very well. The values of the interband absorption coefficient measured with short high-intensity laser pulses agree with the literature values measured at low intensity. The free-carrier absorption cross-section sigma was found to be proportional to the absolute temperature, sigma = sigma n+ sigma p=1.7*10-20 T cm2.
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页码:3837 / 3842
页数:6
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