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THE CHARACTERISTICS OF A PLANAR MAGNETRON OPERATED AT A HIGH-POWER INPUT
被引:15
作者
:
NYAIESH, AR
论文数:
0
引用数:
0
h-index:
0
NYAIESH, AR
机构
:
来源
:
THIN SOLID FILMS
|
1981年
/ 86卷
/ 2-3期
关键词
:
D O I
:
10.1016/0040-6090(81)90295-9
中图分类号
:
T [工业技术];
学科分类号
:
08 ;
摘要
:
引用
收藏
页码:267 / 277
页数:11
相关论文
共 5 条
[1]
THE CONSTRUCTION OF SMALL PLANAR MAGNETRONS FOR SPUTTERING USE
ELPHICK, C
论文数:
0
引用数:
0
h-index:
0
ELPHICK, C
[J].
VACUUM,
1981,
31
(01)
: 5
-
7
[2]
THE DEPENDENCE OF DEPOSITION RATE ON POWER INPUT FOR DC AND RF MAGNETRON SPUTTERING
NYAIESH, AR
论文数:
0
引用数:
0
h-index:
0
NYAIESH, AR
HOLLAND, L
论文数:
0
引用数:
0
h-index:
0
HOLLAND, L
[J].
VACUUM,
1981,
31
(07)
: 315
-
317
[3]
NYAIESH AR, VACUUM
[4]
NYAIESH AR, J VAC SCI TECHNOL
[5]
SPUTTERING - REVIEW OF SOME RECENT EXPERIMENTAL AND THEORETICAL ASPECTS
OECHSNER, H
论文数:
0
引用数:
0
h-index:
0
机构:
TECH UNIV CLAUSTHAL,PHYS INST,D-3392 CLAUSTHAL,FED REP GER
TECH UNIV CLAUSTHAL,PHYS INST,D-3392 CLAUSTHAL,FED REP GER
OECHSNER, H
[J].
APPLIED PHYSICS,
1975,
8
(03):
: 185
-
198
←
1
→
共 5 条
[1]
THE CONSTRUCTION OF SMALL PLANAR MAGNETRONS FOR SPUTTERING USE
ELPHICK, C
论文数:
0
引用数:
0
h-index:
0
ELPHICK, C
[J].
VACUUM,
1981,
31
(01)
: 5
-
7
[2]
THE DEPENDENCE OF DEPOSITION RATE ON POWER INPUT FOR DC AND RF MAGNETRON SPUTTERING
NYAIESH, AR
论文数:
0
引用数:
0
h-index:
0
NYAIESH, AR
HOLLAND, L
论文数:
0
引用数:
0
h-index:
0
HOLLAND, L
[J].
VACUUM,
1981,
31
(07)
: 315
-
317
[3]
NYAIESH AR, VACUUM
[4]
NYAIESH AR, J VAC SCI TECHNOL
[5]
SPUTTERING - REVIEW OF SOME RECENT EXPERIMENTAL AND THEORETICAL ASPECTS
OECHSNER, H
论文数:
0
引用数:
0
h-index:
0
机构:
TECH UNIV CLAUSTHAL,PHYS INST,D-3392 CLAUSTHAL,FED REP GER
TECH UNIV CLAUSTHAL,PHYS INST,D-3392 CLAUSTHAL,FED REP GER
OECHSNER, H
[J].
APPLIED PHYSICS,
1975,
8
(03):
: 185
-
198
←
1
→