ANALYTICAL THERMAL-MODEL OF ULTRAVIOLET-LASER ABLATION WITH SINGLE-PHOTON ABSORPTION IN THE PLUME

被引：54

作者：

TOKAREV, VN

LUNNEY, JG

MARINE, W

SENTIS, M

机构：

[1] FAC SCI LUMINY,DEPT PHYS,CNRS,URA 783,F-13288 MARSEILLE 9,FRANCE

[2] RUSSIAN ACAD SCI,INST GEN PHYS,MOSCOW 117942,RUSSIA

[3] UNIV DUBLIN TRINITY COLL,DEPT PHYS,DUBLIN 2,IRELAND

[4] FAC SCI LUMINY,IRPHE,CNRS,UMR 138,F-13288 MARSEILLE 9,FRANCE

来源：

JOURNAL OF APPLIED PHYSICS | 1995年 / 78卷 / 02期

关键词：

D O I：

10.1063/1.360365

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

An analytical thermal model of ultraviolet (UV) laser ablation has been proposed. The approximation used to describe the absorption of the incident beam in excimer laser induced ablation plasma, for the case of single-photon absorption σeff(t)=const. (where σeff is the effective absorption cross section of ejected species) gives analytical results on UV laser ablation kinetics. In particular, the changing (increasing or decreasing) slope of the curve of etch depth, z, versus logarithmic fluence, ln E, is explained. © 1995 American Institute of Physics.

引用

页码：1241 / 1246

页数：6

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