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NEW HIGH SENSITIVE ELECTRON RESIST MATERIALS
被引:6
作者
:
PAAL, G
论文数:
0
引用数:
0
h-index:
0
机构:
AEG TELEFUNKEN,RES INST,ULM,WEST GERMANY
AEG TELEFUNKEN,RES INST,ULM,WEST GERMANY
PAAL, G
[
1
]
STRAHLE, UD
论文数:
0
引用数:
0
h-index:
0
机构:
AEG TELEFUNKEN,RES INST,ULM,WEST GERMANY
AEG TELEFUNKEN,RES INST,ULM,WEST GERMANY
STRAHLE, UD
[
1
]
KIELHORN, G
论文数:
0
引用数:
0
h-index:
0
机构:
AEG TELEFUNKEN,RES INST,ULM,WEST GERMANY
AEG TELEFUNKEN,RES INST,ULM,WEST GERMANY
KIELHORN, G
[
1
]
机构
:
[1]
AEG TELEFUNKEN,RES INST,ULM,WEST GERMANY
来源
:
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
|
1973年
/ 120卷
/ 12期
关键词
:
D O I
:
10.1149/1.2403350
中图分类号
:
O646 [电化学、电解、磁化学];
学科分类号
:
081704 ;
摘要
:
引用
收藏
页码:1714 / 1716
页数:3
相关论文
共 6 条
[1]
HIGH-RESOLUTION POSITIVE RESISTS FOR ELECTRON-BEAM EXPOSURE
HALLER, I
论文数:
0
引用数:
0
h-index:
0
HALLER, I
HATZAKIS, M
论文数:
0
引用数:
0
h-index:
0
HATZAKIS, M
SRINIVASAN, R
论文数:
0
引用数:
0
h-index:
0
SRINIVASAN, R
[J].
IBM JOURNAL OF RESEARCH AND DEVELOPMENT,
1968,
12
(03)
: 251
-
+
[2]
EPOXIDE-CONTAINING POLYMERS AS HIGHLY SENSITIVE ELECTRON-BEAM RESISTS
HIRAI, T
论文数:
0
引用数:
0
h-index:
0
HIRAI, T
HATANO, Y
论文数:
0
引用数:
0
h-index:
0
HATANO, Y
NONOGAKI, S
论文数:
0
引用数:
0
h-index:
0
NONOGAKI, S
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1971,
118
(04)
: 669
-
&
[3]
POLYMERIC ELECTRON BEAM RESISTS
KU, HY
论文数:
0
引用数:
0
h-index:
0
机构:
Westinghouse Research Laboratories, Pittsburgh, Pennsylvania
KU, HY
SCALA, LC
论文数:
0
引用数:
0
h-index:
0
机构:
Westinghouse Research Laboratories, Pittsburgh, Pennsylvania
SCALA, LC
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1969,
116
(07)
: 980
-
&
[4]
LENZ RW, 1968, ORGANIC CHEMISTRY SY
[5]
PERKINS KD, 1968, KODAK PHOTORESIST SE, V2, P39
[6]
ELECTRON BEAM EXPOSURE OF PHOTORESISTS
THORNLEY, RF
论文数:
0
引用数:
0
h-index:
0
THORNLEY, RF
SUN, T
论文数:
0
引用数:
0
h-index:
0
SUN, T
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1965,
112
(11)
: 1151
-
&
←
1
→
共 6 条
[1]
HIGH-RESOLUTION POSITIVE RESISTS FOR ELECTRON-BEAM EXPOSURE
HALLER, I
论文数:
0
引用数:
0
h-index:
0
HALLER, I
HATZAKIS, M
论文数:
0
引用数:
0
h-index:
0
HATZAKIS, M
SRINIVASAN, R
论文数:
0
引用数:
0
h-index:
0
SRINIVASAN, R
[J].
IBM JOURNAL OF RESEARCH AND DEVELOPMENT,
1968,
12
(03)
: 251
-
+
[2]
EPOXIDE-CONTAINING POLYMERS AS HIGHLY SENSITIVE ELECTRON-BEAM RESISTS
HIRAI, T
论文数:
0
引用数:
0
h-index:
0
HIRAI, T
HATANO, Y
论文数:
0
引用数:
0
h-index:
0
HATANO, Y
NONOGAKI, S
论文数:
0
引用数:
0
h-index:
0
NONOGAKI, S
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1971,
118
(04)
: 669
-
&
[3]
POLYMERIC ELECTRON BEAM RESISTS
KU, HY
论文数:
0
引用数:
0
h-index:
0
机构:
Westinghouse Research Laboratories, Pittsburgh, Pennsylvania
KU, HY
SCALA, LC
论文数:
0
引用数:
0
h-index:
0
机构:
Westinghouse Research Laboratories, Pittsburgh, Pennsylvania
SCALA, LC
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1969,
116
(07)
: 980
-
&
[4]
LENZ RW, 1968, ORGANIC CHEMISTRY SY
[5]
PERKINS KD, 1968, KODAK PHOTORESIST SE, V2, P39
[6]
ELECTRON BEAM EXPOSURE OF PHOTORESISTS
THORNLEY, RF
论文数:
0
引用数:
0
h-index:
0
THORNLEY, RF
SUN, T
论文数:
0
引用数:
0
h-index:
0
SUN, T
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1965,
112
(11)
: 1151
-
&
←
1
→