POSITIVE PHOTORESIST PROCESS SIMULATION OVER NONPLANAR SUBSTRATES

被引：5

作者：

BAROUCH, E ^{[1
]}

BRADIE, B ^{[1
]}

HOLLERBACH, U ^{[1
]}

ORSZAG, SA ^{[1
]}

机构：

[1] PRINCETON UNIV,PROGRAM APPL & COMPUTAT MATH,PRINCETON,NJ 08544

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1990年 / 8卷 / 06期

关键词：

D O I：

10.1116/1.585092

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A three-dimensional computational simulator of nonplanar substrates coated with positive photoresists is presented. The model includes four major steps: projection printing, exposure, post-exposure baking (PEB), and dissolution. Projection printing is based on Hopkins' classical work. The exposure model employs the full nonlinear wave equation coupled with the photoactive compound (PAC) bleaching rate equation. These equations are solved using a spectral element iterative scheme. The PEB is treated as a material diffusion equation employing ideas introduced by Mack and the dissolution algorithm is our LEAD (least action dissolution) algorithm modified for nonplanar substrates. Several realistic examples are presented displaying final profiles at various dissolution times.

引用

页码：1432 / 1436

页数：5

共 11 条

[1] STANDING WAVES IN OPTICAL POSITIVE PHOTORESIST FILMS - A NEW APPROACH [J].

BABU, SV ;

BAROUCH, E .

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA A-OPTICS IMAGE SCIENCE AND VISION, 1988, 5 (09) :1460-1465

[2] SIMULATION OF 3-DIMENSIONAL POSITIVE PHOTORESIST IMAGES [J].

BAROUCH, E ;

BRADIE, B ;

BABU, SV .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1989, 28 (12) :2624-2628

[3]

BAROUCH E, 1990, SPIE P, V1264, P334

[4]

Born M., 1980, PRINCIPLES OPTICS

[5]

BRADIE B, 1990, THESIS CLARKSON U

[6] OPTICAL LITHOGRAPHY [J].

DILL, FH .

IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) :440-444

[7]

GHADDAR NK, 1986, NUMERICAL HEAT TRANS, V9, P227

[8] ON THE DIFFRACTION THEORY OF OPTICAL IMAGES [J].

HOPKINS, HH .

PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1953, 217 (1130) :408-432

[9] PARTIALLY COHERENT IMAGING IN 2 DIMENSIONS AND THE THEORETICAL LIMITS OF PROJECTION PRINTING IN MICROFABRICATION [J].

LIN, BJ .

IEEE TRANSACTIONS ON ELECTRON DEVICES, 1980, 27 (05) :931-938

[10] REDUCTION OF PHOTORESIST STANDING-WAVE EFFECTS BY POST-EXPOSURE BAKE [J].

WALKER, EJ .

IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) :464-466

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