SIMULATION OF 3-DIMENSIONAL POSITIVE PHOTORESIST IMAGES

被引：4

作者：

BAROUCH, E ^{[1
]}

BRADIE, B ^{[1
]}

BABU, SV ^{[1
]}

机构：

[1] CLARKSON UNIV,DEPT CHEM ENGN,POTSDAM,NY 13676

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1989年 / 28卷 / 12期

关键词：

D O I：

10.1143/JJAP.28.2624

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2624 / 2628

页数：5

共 22 条

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[6]

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[7]

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[8]

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[9] MODELING PROJECTION PRINTING OF POSITIVE PHOTORESISTS [J].

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[10] OPTICAL LITHOGRAPHY [J].

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