EXACT SOLUTION OF DILLS MODEL-EQUATIONS FOR POSITIVE PHOTORESIST KINETICS

被引:34
作者
BABU, SV [1 ]
BAROUCH, E [1 ]
机构
[1] CLARKSON UNIV,DEPT MATH & COMP SCI,POTSDAM,NY 13676
关键词
D O I
10.1109/EDL.1986.26362
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:252 / 253
页数:2
相关论文
共 5 条
  • [1] BABU SV, 1985, J IMAGING TECHNOL, V11, P168
  • [2] BABU SV, 1985, P SOC PHOTO-OPT INST, V539, P36, DOI 10.1117/12.947812
  • [3] CHARACTERIZATION OF POSITIVE PHOTORESIST
    DILL, FH
    HORNBERGER, WP
    HAUGE, PS
    SHAW, JM
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) : 445 - 452
  • [4] OPTICAL LITHOGRAPHY
    DILL, FH
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) : 440 - 444
  • [5] NEUREUTHER AR, 1985, SOLID STATE TECHNOL, V28, P139