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EXACT SOLUTION OF DILLS MODEL-EQUATIONS FOR POSITIVE PHOTORESIST KINETICS
被引:34
作者
:
BABU, SV
论文数:
0
引用数:
0
h-index:
0
机构:
CLARKSON UNIV,DEPT MATH & COMP SCI,POTSDAM,NY 13676
CLARKSON UNIV,DEPT MATH & COMP SCI,POTSDAM,NY 13676
BABU, SV
[
1
]
BAROUCH, E
论文数:
0
引用数:
0
h-index:
0
机构:
CLARKSON UNIV,DEPT MATH & COMP SCI,POTSDAM,NY 13676
CLARKSON UNIV,DEPT MATH & COMP SCI,POTSDAM,NY 13676
BAROUCH, E
[
1
]
机构
:
[1]
CLARKSON UNIV,DEPT MATH & COMP SCI,POTSDAM,NY 13676
来源
:
IEEE ELECTRON DEVICE LETTERS
|
1986年
/ 7卷
/ 04期
关键词
:
D O I
:
10.1109/EDL.1986.26362
中图分类号
:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号
:
0808 ;
0809 ;
摘要
:
引用
收藏
页码:252 / 253
页数:2
相关论文
共 5 条
[1]
BABU SV, 1985, J IMAGING TECHNOL, V11, P168
[2]
BABU SV, 1985, P SOC PHOTO-OPT INST, V539, P36, DOI 10.1117/12.947812
[3]
CHARACTERIZATION OF POSITIVE PHOTORESIST
DILL, FH
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
DILL, FH
HORNBERGER, WP
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
HORNBERGER, WP
HAUGE, PS
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
HAUGE, PS
SHAW, JM
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
SHAW, JM
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1975,
ED22
(07)
: 445
-
452
[4]
OPTICAL LITHOGRAPHY
DILL, FH
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
DILL, FH
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1975,
ED22
(07)
: 440
-
444
[5]
NEUREUTHER AR, 1985, SOLID STATE TECHNOL, V28, P139
←
1
→
共 5 条
[1]
BABU SV, 1985, J IMAGING TECHNOL, V11, P168
[2]
BABU SV, 1985, P SOC PHOTO-OPT INST, V539, P36, DOI 10.1117/12.947812
[3]
CHARACTERIZATION OF POSITIVE PHOTORESIST
DILL, FH
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
DILL, FH
HORNBERGER, WP
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
HORNBERGER, WP
HAUGE, PS
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
HAUGE, PS
SHAW, JM
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
SHAW, JM
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1975,
ED22
(07)
: 445
-
452
[4]
OPTICAL LITHOGRAPHY
DILL, FH
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
DILL, FH
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1975,
ED22
(07)
: 440
-
444
[5]
NEUREUTHER AR, 1985, SOLID STATE TECHNOL, V28, P139
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1
→