RESIST DEVELOPMENT DESCRIBED BY LEAST ACTION PRINCIPLE-LINE PROFILE PREDICTION

被引：8

作者：

BAROUCH, E ^{[1
]}

BRADIE, BD ^{[1
]}

BABU, SV ^{[1
]}

机构：

[1] CLARKSON UNIV,DEPT CHEM ENGN,POTSDAM,NY 13676

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 06期

关键词：

D O I：

10.1116/1.584088

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：2234 / 2237

页数：4

共 16 条

[1]

BABU SV, 1987, STUD APPL MATH, V77, P173

[2] STANDING WAVES IN OPTICAL POSITIVE PHOTORESIST FILMS - A NEW APPROACH [J].

BABU, SV ;

BAROUCH, E .

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA A-OPTICS IMAGE SCIENCE AND VISION, 1988, 5 (09) :1460-1465

[3] EXPOSURE BLEACHING OF NONLINEAR RESIST MATERIALS - EXACT SOLUTION [J].

BABU, SV ;

BAROUCH, E .

IEEE ELECTRON DEVICE LETTERS, 1987, 8 (09) :401-403

[4] EXACT SOLUTION OF DILLS MODEL-EQUATIONS FOR POSITIVE PHOTORESIST KINETICS [J].

BABU, SV ;

BAROUCH, E .

IEEE ELECTRON DEVICE LETTERS, 1986, 7 (04) :252-253

[5] MODELING PROJECTION PRINTING OF POSITIVE PHOTORESISTS [J].

DILL, FH ;

NEUREUTHER, AR ;

TUTTLE, JA ;

WALKER, EJ .

IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) :456-464

[6] OPTICAL LITHOGRAPHY [J].

DILL, FH .

IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) :440-444

[7]

HOFER DC, 1982, P SOC PHOTO-OPT INST, V334, P196, DOI 10.1117/12.933577

[8]

KIM DJ, 1984, IEEE T ELECTRON DEV, V31, P1730

[9]

MACK C, 1988, SPIE P, V922, P135

[10] CONTRAST ENHANCEMENT TECHNIQUES FOR SUBMICRON OPTICAL LITHOGRAPHY [J].

MACK, CA .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (04) :1428-1431

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