CONTRAST ENHANCEMENT TECHNIQUES FOR SUBMICRON OPTICAL LITHOGRAPHY

被引：5

作者：

MACK, CA

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1987年 / 5卷 / 04期

关键词：

D O I：

10.1116/1.574614

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1428 / 1431

页数：4

共 11 条

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GRIFFING, BF ;

WEST, PR .

[3]

GRIFFING BF, 1985, SOLID STATE TECHNOL, V28, P152

[4]

Mack C. A., 1986, Proceedings of the SPIE - The International Society for Optical Engineering, V631, P276, DOI 10.1117/12.963652

[5]

MACK CA, 1985, P SOC PHOTO-OPT INST, V538, P207

[6]

MACK CA, 1985, APPL OPTICS, V25, P1958

[7]

POL V, 1986, P SOC PHOTO-OPT INS, V633, P6

[8]

Sheats J. R., 1986, Proceedings of the SPIE - The International Society for Optical Engineering, V631, P171, DOI 10.1117/12.963638

Vollenbroek, F.A. ;

Nijssen, W.P.M. ;

Kroon, H.J.J. ;

Yilmaz, B. .

[10]

WEST PR, 1983, P SOC PHOTO-OPT INST, V394, P33, DOI 10.1117/12.935119