SOME METAL VAPOR IONIZATION MEASUREMENTS IN PLASMA BEAM EVAPORATION SYSTEMS

被引：4

作者：

ELMIGER, M

BERGMANN, E

机构：

[1] Balzers Limited, FL-9496 Balzers, Wear Protection

来源：

SURFACE & COATINGS TECHNOLOGY | 1993年 / 61卷 / 1-3期

关键词：

D O I：

10.1016/0257-8972(93)90242-G

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The influence of the plasma configuration on the coating rate was investigated for a plasma beam ion plating system. The influence of substrate polarization, magnetic fields and shielding grids on the deposition rate can be used to estimate the ionized fraction of the metal vapour. The results are complemented by some Langmuir probe measurements.

引用

收藏

页码：300 / 304

页数：5

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