DEPOSITION OF SILVER FILMS BY PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION

被引：34

作者：

OEHR, C

SUHR, H

机构：

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1989年 / 49卷 / 06期

关键词：

D O I：

10.1007/BF00616995

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：691 / 696

页数：6

共 20 条

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