TWYMAN-GREEN INTERFEROMETRY FOR MEASUREMENTS OF STRESSES IN THIN FILMS ON OPTICALLY FLAT SILICON SUBSTRATES

被引：3

作者：

DRUM, CM

机构：

来源：

关键词：

D O I：

10.1063/1.1684091

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：853 / &

共 11 条

[1]

ANDERSON JC, 1966, THIN FILMS ED, P261

[2]

Campbell D. S., 1966, BASIC PROBLEMS THIN, P223

[3] GROWTH AND MORPHOLOGY OF SILICON RIBBONS [J].

DERMATIS, SN ;

FAUST, JW ;

JOHN, HF .

[4] STRESSES DEVELOPED IN OPTICAL FILM COATINGS [J].

ENNOS, AE .

APPLIED OPTICS, 1966, 5 (01) :51-&

[5] STRESS ANISOTROPY IN EVAPORATED IRON FILMS [J].

FINEGAN, JD ;

HOFFMAN, RW .

GLANG, R ;

HOLMWOOD, RA ;

ROSENFELD, RL .

[7]

Herzog A.H., 1965, Process for Polishing Semiconductor Materials, Patent No. [3170273A, 3170273]

[8]

HOFFMAN RW, 1966, THIN FILMS, P261

[9]

JENKINS FA, 1957, FUNDAMENTALS OPTICS, P267

[10]

JENKINS FA, 1957, FUNDAMENTALS OPTICS, P256