THE PHOTOEMISSION SPECTROMICROSCOPE MULTIPLE-APPLICATION X-RAY-IMAGING UNDULATOR MICROSCOPE (MAXIMUM)

被引：6

作者：

NG, W

RAYCHAUDHURI, AK

CROSSLEY, S

CROSSLEY, D

GONG, C

GUO, J

HANSEN, R

MARGARITONDO, G

CERRINA, F

UNDERWOOD, J

PERERA, R

KORTRIGHT, J

机构：

[1] UNIV WISCONSIN,CTR SYNCHROTRON RADIAT,MADISON,WI 53706

[2] UNIV CALIF BERKELEY LAWRENCE BERKELEY LAB,CTR XRAY OPT,BERKELEY,CA 94720

[3] UNIV WISCONSIN,DEPT ELECT & COMP ENGN,MADISON,WI 53706

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1990年 / 8卷 / 03期

关键词：

D O I：

10.1116/1.576736

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

We discuss the implementation of phase I of the spectromicroscopy program Maximum (multiple-application x-ray imaging undulator microscope) at the Wisconsin Synchrotron Radiation Center. Successful feasibility tests included taking photoemission micrographs with lateral resolution of a few microns, line scans, knife-edge tests, photon flux measurements, and characterization of the focusing performance. © 1990, American Vacuum Society. All rights reserved.

引用

页码：2563 / 2565

页数：3