PRELIMINARY-RESULTS ON CU DIFFUSION THROUGH GRAIN-BOUNDARIES OF THIN ION-PLATED AG-SN FILMS

被引:4
作者
BUKALUK, A
ROZWADOWSKI, M
SIUDA, R
机构
关键词
D O I
10.1016/0039-6028(88)90541-9
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
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页码:381 / 385
页数:5
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共 8 条
[1]   PHYSICS OF ION PLATING AND ION-BEAM DEPOSITION [J].
AISENBERG, S ;
CHABOT, RW .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (01) :104-107
[2]   ANALYSIS OF PENETRATION DATA FROM GRAIN BOUNDARY DIFFUSION EXPERIMENTS [J].
CANON, RF ;
STARK, JP .
JOURNAL OF APPLIED PHYSICS, 1969, 40 (11) :4361-&
[3]  
CRANK J, 1956, MATH DIFFUSION, P47
[4]  
Gupta D., 1978, Thin films. Interdiffusion and reactions, P161
[5]   DIFFUSION-PROCESSES IN THIN-FILMS [J].
GUPTA, D ;
HO, PS .
THIN SOLID FILMS, 1980, 72 (03) :399-418
[6]   FORMALISM FOR DETERMINING GRAIN-BOUNDARY DIFFUSION-COEFFICIENTS USING SURFACE ANALYSIS [J].
HALL, PM ;
MORABITO, JM .
SURFACE SCIENCE, 1976, 59 (02) :624-630
[7]   TECHNOLOGY AND APPLICATIONS OF BROAD-BEAM ION SOURCES USED IN SPUTTERING .1. ION-SOURCE TECHNOLOGY [J].
KAUFMAN, HR ;
CUOMO, JJ ;
HARPER, JME .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (03) :725-736
[8]   ION-ASSISTED THIN-FILM DEPOSITION AND APPLICATIONS [J].
MARTIN, PJ .
VACUUM, 1986, 36 (10) :585-590