CHEMISTRY OF POLYMER-MOLECULES FOR ULTRATHIN FILMS

[1] BALLARD DGH, 1958, Patent No. 864962

[2] BALLARD DGH, 1964, Patent No. 3121766

[3] BERG S, 1986, MAKROMOL CHEM-RAPID, V7, P381

[4] BLUMSTEIN A, 1978, LIQUID CRYSTALLINE O, P56

[5] BOWDEN MJ, 1979, SOLID STATE TECHNOL, V22, P72

[6] POLYVINYL ARENE SULFONES) AS NOVEL POSITIVE PHOTORESISTS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (10) : 1370 - 1374

[7] A SENSITIVE NOVOLAC-BASED POSITIVE ELECTRON RESIST [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (06) : 1304 - 1313

[8] BRAULT RG, 1982, NOV P REG TECH C PHO, P235

[9] Calundann GW, 1982, P RA WELCH C CHEM RE, P247

[10] STRUCTURE-PROPERTY RELATIONS IN LINEAR AND CROSS-LINKED LIQUID-CRYSTALLINE POLYMERS [J]. MAKROMOLEKULARE CHEMIE-MACROMOLECULAR SYMPOSIA, 1986, 4 : 91 - 101

[1] BALLARD DGH, 1958, Patent No. 864962

[2] BALLARD DGH, 1964, Patent No. 3121766

[3] BERG S, 1986, MAKROMOL CHEM-RAPID, V7, P381

[4] BLUMSTEIN A, 1978, LIQUID CRYSTALLINE O, P56

[5] BOWDEN MJ, 1979, SOLID STATE TECHNOL, V22, P72

[6] POLYVINYL ARENE SULFONES) AS NOVEL POSITIVE PHOTORESISTS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (10) : 1370 - 1374

[7] A SENSITIVE NOVOLAC-BASED POSITIVE ELECTRON RESIST [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (06) : 1304 - 1313

[8] BRAULT RG, 1982, NOV P REG TECH C PHO, P235

[9] Calundann GW, 1982, P RA WELCH C CHEM RE, P247

[10] STRUCTURE-PROPERTY RELATIONS IN LINEAR AND CROSS-LINKED LIQUID-CRYSTALLINE POLYMERS [J]. MAKROMOLEKULARE CHEMIE-MACROMOLECULAR SYMPOSIA, 1986, 4 : 91 - 101