EFFECT OF EXTREMELY THIN NITROGENOUS SURFACE FILMS ON PHOSPHORUS-IMPURITY PROFILES IN SILICON

被引：3

作者：

MAKRIS, J

FERRISPR.A

JOSHI, ML

机构：

来源：

IBM JOURNAL OF RESEARCH AND DEVELOPMENT | 1971年 / 15卷 / 02期

关键词：

D O I：

10.1147/rd.152.0132

中图分类号：

TP3 [计算技术、计算机技术];

学科分类号：

0812 ;

摘要：

引用

页码：132 / &

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